On July 19th, 2021, NextLabs announced, the release of DAE for SAP 2021. This is an enhancement to the industry leading DAE for SAP, which uses attribute-based and centralized policies to improve security and compliance posture for SAP.
DAE for SAP helps overcome common challenges SAP customers face, such as balancing the increasing need to share with employees and partners while securing business-critical data, ensuring regulatory compliance, and reducing security management costs.
Key enhancements of DAE for SAP 2021, include dynamic data filtering, geolocation support, and extensible support for SAP applications. Additionally, DAE for SAP added improved user messaging, extended enforcement on Data Manipulation Language (DML), simplified configuration, and improved error handling in this 2021 release.
DAE for SAP provides dynamic data-level security controls and fine-grained data access governance to SAP applications. The product can be implemented rapidly with zero code and zero role impact, to enforce real time data-level security controls using NextLabs’ Dynamic Authorization and attribute-based (ABAC) policy engine. DAE for SAP provides dynamic field-level data masking and data segregation, while monitoring data access from within the data access layer of SAP S/4HANA® and SAP ECC. This enables the enforcement to work independent of UI, API, microservice, batch job, ad-hoc query, report, Transaction, and Fiori app with seamless support for debug and table content access, while allowing a new policy to be implemented and tested in under an hour.
As the result, enterprises can enable employees, external partners, and contractors to securely share information, improving business agility. The patented policy-driven dynamic authorization platform also helps organizations identify and protect data, monitor, and control access to sensitive data, and help prevent regulatory violations, whether it be in the cloud or on-premises.
If you have any questions about DAE for SAP 2021, please do not hesitate to leave a question below and I would be happy to further discuss the product.